Mass-limited, debris-free laser-plasma EUV source
Mass-limited, debris-free laser-plasma EUV source
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质量有限、无碎片激光等离子体 EUV 源
DOI：
10.1016/s0030-4018(97)00421-5
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发表时间：
1998
影响因子：
2.4
通讯作者：
G. Shimkaveg
中科院分区：
文献类型：
--
作者：
M. Richardson;D. Torres;C. DePriest;F. Jin;G. Shimkaveg
描述了基于冷冻水滴目标的激光等离子体极紫外线发射源的开发，该发射源基本上没有碎片，并且能够连续、高重复率（>1 kHz）操作。由适度（<1J）激光能量产生的该等离子体在13和11.6nm（EUV投影光刻的优选波长）处产生丰富的发射，具有可忽略的靶操作成本。
The development of a laser-plasma EUV line emission source based on frozen water droplet targets which is essentially debris-free and capable of continuous, high-repetition-rate (>1 kHz) operation is described. Created by modest (<1 J) laser energies, this plasma produces copious emission at 13 and 11.6 nm, the preferred wavelengths for EUV projection lithography, with negligible target operation costs.