Healing of reduced graphene oxide with methane + hydrogen plasma

Healing of reduced graphene oxide with methane + hydrogen plasma
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DOI:
10.1016/j.carbon.2017.05.032
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发表时间:
2017-08
期刊:
影响因子:
10.9
通讯作者:
Detao Zhu;H. Pu;Peng Lv;Zhijia Zhu;Conghao Yang;R. Zheng;Zhongyue Wang;Chun-Xiao Liu;E. Hu
Detao Zhu;H. Pu;Peng Lv;Zhijia Zhu;Conghao Yang;R. Zheng;Zhongyue Wang;Chun-Xiao Liu;E. Hu
中科院分区:
材料科学2区
文献类型:
--
作者:
Detao Zhu;H. Pu;Peng Lv;Zhijia Zhu;Conghao Yang;R. Zheng;Zhongyue Wang;Chun-Xiao Liu;E. Hu

文献摘要

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报道了一种利用甲烷+氢等离子体修复还原氧化石墨烯(RGO)缺陷的方法。氢的加入显著地改变了石墨烯的刻蚀和生长之间的平衡,并且抑制了碳纳米颗粒的成核。在800 °C下观察到RGO的最佳恢复,导致最大的积分拉曼2D/G峰面积比(0.56)和最高的霍尔迁移率(52 cm 2 V − 1 s −1)。密度泛函理论计算表明,修复过程主要是悬挂键与CH 2和CH自由基之间的反应。
A method to heal defects in reduced graphene oxide (RGO) is reported, accomplished by using methane + hydrogen plasma. The addition of hydrogen notably shifts the equilibrium between etching and growth of graphene, and suppresses the nucleation of carbon nanoparticles. The best recovery of RGO is observed at 800 °C, resulting in largest integrated Raman 2D/G peak area ratio (0.56) and highest Hall mobility (52 cm2V−1s−1). A density functional theory calculation reveals that the repair process is dominated by reaction between the dangling bonds and CH2and CH radicals.