Plasma characterization in reactive sputtering processes of Ti in Ar/O2 mixtures operated in metal, transition and poisoned modes: a comparison between direct current and high-power impulse magnetron discharges
Plasma characterization in reactive sputtering processes of Ti in Ar/O2 mixtures operated in metal, transition and poisoned modes: a comparison between direct current and high-power impulse magnetron discharges
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DOI：
10.1140/epjd/e2017-80106-x
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发表时间：
2017-10
期刊：
影响因子：
--
通讯作者：
F. Haase;H. Kersten;D. Lundin
中科院分区：
文献类型：
--
作者：
F. Haase;H. Kersten;D. Lundin
本文研究了两种反应溅射技术：直流磁控溅射（DCMS）和高功率脉冲磁控溅射（HiPIMS），在不同的Ar/O2混合气体中使用Ti靶进行溅射。在不同的操作模式，包括纯氩，金属，过渡和化合物模式的过程进行了表征。能量通量数据以及电子密度和温度的数据相结合，以获得知识的趋势和变化的内部过程中的等离子体特性的不同模式的调查。尽管质量沉积速率大幅降低（DCMS中为10倍，HiPIMS中为14倍），但当从金属模式过渡到化合物模式时，我们检测到DCMS中的总能量通量没有显著降低，HiPIMS中仅略有降低（<20%）。考虑到中性通量对总能量通量的贡献已知是显著的，这样的结果是令人惊讶的。相反，我们发现中性成分的减少被电子和离子通量成分的增加所补偿，这在实验中被检测为有效电子温度的增加和随着氧气流速的增加而略微增加（DCMS）或基本恒定（HiPIMS）的电子密度。图形摘要
AbstractTwo reactive sputtering techniques have been studied: direct current magnetron sputtering (DCMS) and high-power impulse magnetron sputtering (HiPIMS), operated in various Ar/O2gas mixtures using a Ti target. The processes were characterized during different modes of operation including pure argon, metallic, transition and compound mode. Energy flux data as well as data on electron density and temperature were combined to obtain knowledge about the trends and changes in the investigated internal process plasma properties for the different modes investigated. Although there is a large reduction of the mass deposition rate (a factor 10 in DCMS and a factor 14 in HiPIMS), when transiting from the metal to compound mode, we detect no significant decrease of the total energy flux in DCMS and only a minor decrease in HiPIMS ( <20%). Such a result is surprising considering that the neutral flux contribution to the total energy flux is known to be significant. Instead, we find that the reduction of the neutral component is compensated by an increase in the electron and ion flux components, which is experimentally detected as an increase of the effective electron temperature and a slightly increasing (DCMS) or essentially constant (HiPIMS) electron density with increasing oxygen flow rate.Graphical abstract