Heat of Adsorption and Thin Film Surface Area Studies of a Silica Sol-Gel Film Exposed to HCl and H2O
Heat of Adsorption and Thin Film Surface Area Studies of a Silica Sol-Gel Film Exposed to HCl and H2O
复制标题
暴露于 HCl 和 H2O 的二氧化硅溶胶-凝胶薄膜的吸附热和薄膜表面积研究
作者：
K. Pfeifer
研究了H2 O和HCl在涂敷于声表面波（SAW）器件上的Stoeber溶胶-凝胶膜上的吸附热和表面积。与SAW装置测量的吸附等温线进行比较的吸附模型的Brunauer，Emmett，和泰勒（BET）。发现第一单层的H{sub 2}O和HCl的吸附热分别为14.6和5.3千卡/摩尔。还使用BET模型测定膜的表面积。将结果与从膜厚度和颗粒尺寸计算的表面积进行比较。参考文献50篇，图5。
Heat of adsorption and surface area studies have been undertaken for H{sub 2}O and HCl adsorbing on a Stoeber sol-gel film coated on a surface acoustic wave (SAW) device. Adsorption isotherms measured with the SAW device are compared to the adsorption model of Brunauer, Emmett, and Teller (BET). The heat of adsorption for the first monolayer of H{sub 2}O and HCl was found to be 14.6 and 5.3 kcal/mol, respectively. The surface area of the film was also determined using the BET model. Results are compared to surface areas calculated from the film thickness and particle size. 50 refs., 5 figs.