NANOFABRICATION OF THIN CHROMIUM FILM DEPOSITED ON SI(100) SURFACES BY TIP INDUCED ANODIZATION IN ATOMIC-FORCE MICROSCOPY
NANOFABRICATION OF THIN CHROMIUM FILM DEPOSITED ON SI(100) SURFACES BY TIP INDUCED ANODIZATION IN ATOMIC-FORCE MICROSCOPY
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DOI：
10.1063/1.114402
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发表时间：
1995-08-28
影响因子：
4
通讯作者：
CHOW, P
中科院分区：
文献类型：
--
作者：
WANG, DW;TSAU, LM;CHOW, P
利用原子力显微镜（AFM）在金属薄膜上写入纳米结构。书写实验在具有可变湿度的氮气环境中进行。使用p型重掺杂硅原子力显微镜针尖，在针尖和沉积在Si（100）衬底上的薄铬层表面之间独立地施加偏压。各种形状的突起图案只形成在水吸附的铬表面上施加负偏压时的尖端。它们的尺寸被发现是依赖于写入时间，偏置电压，和湿度。所获得的最小特征尺寸约为20 nm。从俄歇电子能谱（AES）分析，产品被证明是铬的氧化物。表面改性机制似乎是尖端诱导的局部氧化，即，阳极氧化(C)1995年美国物理学会。
Writing of nanostructures on thin metal films using atomic force microscopy (AFM) was demonstrated. The writing experiments were done in a nitrogen ambient having variable humidity. Using a p-type heavily doped silicon AFM tip, a bias voltage was independently applied between the tip and the surface of a thin chromium layer deposited on a Si(100) substrate. Protruded patterns of various shapes were formed only on the water-adsorbed chromium surface when applying a negative bias on the tip. Their sizes were found to be dependent on the writing time, the bias voltage, and the humidity. The smallest feature size obtained is about 20 nm. From Auger electron spectroscopy (AES) analysis, the products are shown to be Cr oxides. The surface modification mechanism appears to be tip-induced local oxidation, i.e., anodization. (C) 1995 American Institute of Physics.