Enhanced high temperature oxidation resistance for γ-TiAl alloy with electrodeposited SiO 2 film
Enhanced high temperature oxidation resistance for γ-TiAl alloy with electrodeposited SiO 2 film
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电沉积SiO 2 膜增强γ-TiAl合金的高温抗氧化性能
DOI：
10.1016/j.corsci.2018.05.025
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发表时间：
2018
影响因子：
8.3
通讯作者：
Guo-Qu Zheng
中科院分区：
文献类型：
--
作者：
Lian-Kui Wu;Wei-Yao Wu;Jia-Lin Song;Guang-Ya Hou;Hua-Zhen Cao;Yi-Ping Tang;Guo-Qu Zheng
采用阴极电沉积法在γ-TiAl合金表面制备了厚度可控的sio2薄膜。研究了试样在900 ℃时的氧化行为。研究了电解时间、沉积电流密度等sio2电沉积参数对薄膜形貌、结构和高温氧化性能的影响。结果表明：在热氧化过程中，电沉积的sio2膜与TiAl合金反应形成富氧化铝和富硅的玻璃状氧化膜，阻止了氧气从空气向膜/合金界面内扩散，使合金的氧化速率显著降低；
Thickness controllable SiO2film was prepared on γ-TiAl alloy by cathodic electrodeposition. The oxidation behaviour of the specimens at 900 °C was studied. The effects of SiO2electrodeposition parameters, such as electrolysis time and deposition current density, on the morphology, structure and high temperature oxidation performance of the film were investigated. Results shown during thermal oxidation, the electrodeposited SiO2film could react with the TiAl alloy to form an alumina- and silicon-enriched glass-like oxide scale, which can prevent the inward diffusion of oxygen from air to the film/alloy interface, resulting in the remarkable decreased oxidation rate of the alloy.