Giant enhancement of the in-plane critical field for thin Al films via proximity coupling to a topological insulator
Giant enhancement of the in-plane critical field for thin Al films via proximity coupling to a topological insulator
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DOI：
10.1103/physrevb.102.144518
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发表时间：
2020-10
影响因子：
3.7
通讯作者：
Zhu Lin;Zhilin Li;Haoyun Deng;Tianhan Liu;Gang Shi;N. Bonesteel;P. Schlottmann;Yong-qing Li;P. Xiong
中科院分区：
文献类型：
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作者：
Zhu Lin;Zhilin Li;Haoyun Deng;Tianhan Liu;Gang Shi;N. Bonesteel;P. Schlottmann;Yong-qing Li;P. Xiong
