Air Damping Effects on Different Modes of AlN-on-Si Microelectromechanical Resonators
Air Damping Effects on Different Modes of AlN-on-Si Microelectromechanical Resonators
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DOI:
10.1109/mems49605.2023.10052273
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发表时间:
2023-01
期刊:
影响因子:
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通讯作者:
Yuncong Liu;S. M. Enamul Hoque Yousuf;Afzaal Qamar;M. Rais-Zadeh;P. Feng
中科院分区:
文献类型:
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作者:
Yuncong Liu;S. M. Enamul Hoque Yousuf;Afzaal Qamar;M. Rais-Zadeh;P. Feng
Piezoelectric thin films have enabled demonstrations of a wide range of piezoelectric-on-silicon (PoS) resonant transducers in microelectromechanical systems (MEMS) industry today. While the actual ambient pressure (p) levels in vacuum packages can greatly affect device performance, a comprehensive study and quantitative understanding of dynamical characteristics of multimode PoS resonators under varying pressure is still lacking and needs to be investigated. In this work, we report the first measurements and analyses of air damping effects on both bulk and flexural resonance modes of AlN-on-Si (AlN/Si) bulk acoustic resonators (BARs). Experimental results are presented for the resonant frequency (f) and quality (Q) factor with p varying from 760Torr down to 100μTorr. For AlN/Si resonator’s bulk mode, f keeps a nearly constant value of 10.291MHz over the pressure range and the Q factor starts to decline when p is above 10Torr. For AlN/Si resonator’s flexural mode, f is stable at 595.3kHz below 20Torr and drops to 595kHz at 760Torr. For the Si-only device’s bulk mode, f ~10.127MHz is independent of p, and a high Q ~257,000 is maintained when p < 3Torr. The present work clearly reveals the different effects that air damping exerts upon the bulk and flexural modes of AlN/Si MEMS resonators, providing new quantitative knowledge and insight for device engineering.