Nanocrystal Film Patterning by Inhibiting Cation Exchange via Electron-Beam or X-ray Lithography
Nanocrystal Film Patterning by Inhibiting Cation Exchange via Electron-Beam or X-ray Lithography
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DOI：
10.1021/nl500349j
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发表时间：
2014-04-01
期刊：
影响因子：
10.8
通讯作者：
Krahne, Roman
中科院分区：
文献类型：
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作者：
Miszta, Karol;Greullet, Fanny;Krahne, Roman
在这封信中，我们报告图案化的胶体dielectric薄膜相结合的直接电子束（电子束）写入与阳离子交换。电子束照射引起存在于表面的配体分子的交联，并且交联的分子充当用于进一步处理的掩模。因此，在随后的阳离子交换步骤中，该步骤通过将基板直接浸入含有新阳离子的溶液中来进行，未暴露于电子束的区域被化学转化，而暴露的区域保持不变。这种选择性保护允许设计由化学上不同的纳米晶体形成的图案，但在均匀的纳米薄膜中。能量色散X射线光谱（EDS）的空间分辨成分分析证实，选择性交换只发生在非辐照区域。我们证明了这种光刻方法的实用性，通过将非辐照区域转换为Cu 2-xSe/Cu 2-xS，在CdSe/CdS薄膜中制造导电线和发光图案。此外，我们表明，X射线照射也可以导致保护从阳离子交换。
In this Letter we report patterning of colloidal nanocrystal films that combines direct e-beam (electron beam) writing with cation exchange. The e-beam irradiation causes cross-linking of the ligand molecules present at the nanocrystal surface, and the cross-linked molecules act as a mask for further processing. Consequently, in the following step of cation exchange, which is performed by directly dipping the substrate in a solution containing the new cations, the regions that have not been exposed to the electron beam are chemically transformed, while the exposed ones remain unchanged. This selective protection allows the design of patterns that are formed by chemically different nanocrystals, yet in a homogeneous nanocrystal film. Spatially resolved compositional analysis by energy-dispersive X-ray spectroscopy (EDS) corroborates that the selective exchange occurs only in the nonirradiated regions. We demonstrate the utility of this lithography approach by fabricating conductive wires and luminescent patterns in CdSe/CdS nanocrystal films by converting nonirradiated regions to Cu2-xSe/Cu2-xS. Furthermore, we show that X-ray irradiation too can lead to protection from cation exchange.