Structure and properties of carbon onion layers deposited onto various substrates
Structure and properties of carbon onion layers deposited onto various substrates
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DOI：
10.1063/1.1421222
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发表时间：
2002-02-01
影响因子：
3.2
通讯作者：
Lambin, P
中科院分区：
文献类型：
--
作者：
Cabioc'h, T;Thune, E;Lambin, P
在高温（大于或等于500℃）下，在沉积在各种衬底（Si (100)， 304 L不锈钢和纯熔融二氧化硅）上的银层中，以高通量（0.5-8 × 10（17）离子cm(-2)）的120 keV碳离子注入。球形碳洋葱（直径3-15纳米）就是这样在银层中产生的。真空退火后，在衬底上沉积了一层纯碳洋葱薄膜。采用原子力显微镜和高分辨率透射电镜对薄膜的结构进行了表征。在二氧化硅衬底上沉积的碳洋葱层的光学透射光谱显示出两个以220 ~ 230 nm和265 nm为中心的吸收峰，分别归因于碳洋葱和残余无序石墨碳的存在。在银碳洋葱复合薄膜上进行的摩擦学实验表明，银碳洋葱复合薄膜的摩擦系数接近纯银薄膜（0.2），但具有更好的磨损性能。(C) 2002年美国物理研究所。
120 keV carbon ions implantations at high fluences (0.5-8x10(17) ions cm(-2)) were performed at elevated temperature (greater than or equal to500 degreesC) in silver layers deposited on various substrates (Si (100), 304 L stainless steel, and pure fused silica). Spherical carbon onions (3-15 nm in diameter) were so produced in the silver layers. A pure carbon onion thin film deposited on the substrate was obtained after annealing in vacuum. Atomic force microscopy and high-resolution transmission electron microscopy experiments were performed to characterize the structure of the thin films. Optical transmittance spectra of carbon onion layers deposited onto silica substrates revealed two absorption peaks centered at 220-230 nm and at 265 nm that were attributed to the presence of carbon onions and residual disordered graphitic carbon, respectively. Tribological experiments performed on silver-carbon onions composite thin films revealed that the friction coefficient is close to that of a pure silver film (0.2) but with much better wear behavior. (C) 2002 American Institute of Physics.