Structure and properties of Ti-Si-N films with ～10 at.% Si deposited using reactive magnetron sputtering with high-flux low-energy ion assistance
Structure and properties of Ti-Si-N films with ～10 at.% Si deposited using reactive magnetron sputtering with high-flux low-energy ion assistance
复制标题
结构%20和%20性能%20of%20Ti-Si-N%20films%20with%20ï½10%20at.%%20Si%20沉积%20using%20reactive%20磁控管%20溅射%20with%20高通量%20低能量%20ion%
DOI：
--
复制
发表时间：
--
期刊：
影响因子：
--
通讯作者：
中科院分区：
文献类型：
--
作者：
