Advanced SOFC Interconnect Development at PNNL

Advanced SOFC Interconnect Development at PNNL
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DOI:
10.1149/1.2729016
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发表时间:
2007-05
期刊:
--
影响因子:
--
通讯作者:
Z. Yang;Guanguang Xia;J. Stevenson
Z. Yang;Guanguang Xia;J. Stevenson
中科院分区:
其他
文献类型:
--
作者:
Z. Yang;Guanguang Xia;J. Stevenson

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PNNL一直在研究金属互连及其与电极的界面,以实现高性能、低成本的平面SOFC堆。这项工作的重点是材料开发和机械理解,目前有三个主要重点领域:1)对候选合金进行表面改性以改善表面稳定性和氧化皮导电性,(2)改善对合金互连和电极之间的相互作用的理解以及电接触层的开发,以及(3)研究和理解在互连双气氛暴露条件下裸露和涂覆的高温抗氧化合金的氧化行为和退化。本文件总结并提供了我们最近在这一领域的发展努力的最新情况。
PNNL has been conducting research on metallic interconnects and their interfaces with electrodes for high performance, low cost planar SOFC stacks. This work, which is focused on both materials development and mechanistic understanding, presently has three primary areas of emphasis: 1) surface modification of candidate alloys for improved surface stability and scale electrical conductivity,(2) improving the understanding of interactions between alloy interconnects and electrodes and development of electrical contact layers, and (3) investigating and understanding the oxidation behavior and degradation of bare and coated high temperature oxidation-resistant alloys under interconnect dual atmosphere exposure conditions. This paper summarizes and provides an update on our recent development efforts in that area.