CMOS-compatible a-Si metalenses on a 12-inch glass wafer for fingerprint imaging
CMOS-compatible a-Si metalenses on a 12-inch glass wafer for fingerprint imaging
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DOI：
10.1515/nanoph-2019-0470
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发表时间：
2020-04-01
期刊：
影响因子：
7.5
通讯作者：
Singh, Navab
中科院分区：
文献类型：
--
作者：
Hu, Ting;Zhong, Qize;Singh, Navab
由人造亚波长纳米结构制成的超透镜显示出光聚焦和小尺寸成像的能力。在这里，我们报告了通过互补金属-氧化物-半导体兼容工艺在12英寸玻璃晶圆上大规模生产非晶硅超透镜的演示。在940 nm波长处，制备的超构透镜的数值孔径为0.496，聚焦光斑尺寸为1.26 μ m。将超构透镜应用于成像系统中，测试成像分辨率。清晰地观察到宽度为2.19 μ m的分辨率图的最小条形。此外，同一系统演示了指纹成像，并证明了使用超透镜阵列的概念，以减少未来紧凑型消费电子产品的系统尺寸。
Metalenses made of artificial sub-wavelength nanostructures have shown the capability of light focusing and imaging with a miniaturized size. Here, we report the demonstration of mass-producible amorphous silicon metalenses on a 12-inch glass wafer via the complementary metal-oxide-semiconductor compatible process. The measured numerical aperture of the fabricated metalens is 0.496 with a focusing spot size of 1.26 mu m at the wavelength of 940 nm. The metalens is applied in an imaging system to test the imaging resolution. The minimum bar of the resolution chart with a width of 2.19 mu m is clearly observed. Furthermore, the same system demonstrates the imaging of a fingerprint, and proofs the concept of using metalens array to reduce the system size for future compact consumer electronics.