Determination of Total Silicon and SiO2 Particles Using an ICP-MS Based Analytical Platform for Toxicokinetic Studies of Synthetic Amorphous Silica
Determination of Total Silicon and SiO2 Particles Using an ICP-MS Based Analytical Platform for Toxicokinetic Studies of Synthetic Amorphous Silica
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DOI：
10.3390/nano10050888
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发表时间：
2020-05-01
期刊：
影响因子：
5.3
通讯作者：
Cubadda, Francesco
中科院分区：
文献类型：
--
作者：
Aureli, Federica;Ciprotti, Maria;Cubadda, Francesco
合成无定形二氧化硅 (SAS) 以热解或沉淀形式制造，是一种广泛用作食品添加剂的纳米材料 (E 551)。 SAS 的口服暴露源于其在食品和膳食补充剂、药品和牙膏中的使用。最近的证据表明，口服接触 SAS 可能会带来健康风险，并强调需要解决 SAS 的潜在毒性，因为不同形式的 SAS 的理化特性会影响该潜在毒性。为此，研究 SAS 毒代动力学至关重要，为此提出了分析策略。最大限度地减少组织中的硅背景、控制污染（包括设备中的硅释放）、高通量样品处理、消除影响电感耦合等离子体质谱 (ICP-MS) 硅检测的光谱干扰以及开发分析质量控制工具是该策略的基石。提出了一种将样品消化与反应池 ICP-MS 硅测定相结合的经过验证的方法。通过用 HNO3、H2O2 和氢氟酸 (HF) 的混合物进行微波溶解，二氧化硅颗粒转化为可溶性硅，而总硅的无干扰 ICP-MS 检测是通过离子分子化学实现的，对于大多数组织，检测限 (LoD) 在 0.2-0.5 mu g Si g(-1) 范围内。通过单颗粒 ICP-MS 评估组织中颗粒 SiO2 的沉积。
Synthetic amorphous silica (SAS), manufactured in pyrogenic or precipitated form, is a nanomaterial with a widespread use as food additive (E 551). Oral exposure to SAS results from its use in food and dietary supplements, pharmaceuticals and toothpaste. Recent evidence suggests that oral exposure to SAS may pose health risks and highlights the need to address the toxic potential of SAS as affected by the physicochemical characteristics of the different forms of SAS. For this aim, investigating SAS toxicokinetics is of crucial importance and an analytical strategy for such an undertaking is presented. The minimization of silicon background in tissues, control of contamination (including silicon release from equipment), high-throughput sample treatment, elimination of spectral interferences affecting inductively coupled plasma mass spectrometry (ICP-MS) silicon detection, and development of analytical quality control tools are the cornerstones of this strategy. A validated method combining sample digestion with silicon determination by reaction cell ICP-MS is presented. Silica particles are converted to soluble silicon by microwave dissolution with mixtures of HNO3, H2O2 and hydrofluoric acid (HF), whereas interference-free ICP-MS detection of total silicon is achieved by ion-molecule chemistry with limits of detection (LoDs) in the range 0.2-0.5 mu g Si g(-1) for most tissues. Deposition of particulate SiO2 in tissues is assessed by single particle ICP-MS.