Highly Versatile and Robust Materials for Soft Imprint Lithography Based on Thiol-ene Click Chemistry
Highly Versatile and Robust Materials for Soft Imprint Lithography Based on Thiol-ene Click Chemistry
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DOI：
10.1002/adma.200800330
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发表时间：
2008-10-02
影响因子：
29.4
通讯作者：
Hawker, Craig J.
中科院分区：
文献类型：
--
作者：
Campos, Luis M.;Meinel, Ines;Hawker, Craig J.
就像“摇和烤”一样简单，通过巯基点击化学，将多功能硫醇与烯烃功能交联剂混合并光固化，从而产生具有突出和可调特性的软压印材料。在环境条件下，材料在2分钟内固化，允许制造具有高纵横比和低于100nm特征的邮票。
As easy as "shake and bake", the mixing and photocuring of poly-functional thiols with alkene-functional cross-linkers, via thiol-ene click chemistry, leads to materials with outstanding and tunable characteristics for soft imprint lithography. The materials are cured within 2 minutes at ambient conditions allowing stamps with high aspect ratio and sub-100nm features to be fabricated.