XPS characterization of ultrafine Si3N4 powders
XPS characterization of ultrafine Si3N4 powders
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DOI：
10.1002/sia.740121004
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发表时间：
1988-07
影响因子：
1.7
通讯作者：
I. Bertóti;G. Varsányi;G. Mink;T. Székely;J. Vaivads;T. Millers;J. Grabis
中科院分区：
文献类型：
--
作者：
I. Bertóti;G. Varsányi;G. Mink;T. Székely;J. Vaivads;T. Millers;J. Grabis
Si_3N_4基陶瓷坯体的力学性能在很大程度上受烧结过程中晶界上形成的相控制。因此，确定初始Si3N4粉末的表面的状态和化学组成具有主要的理论和实际重要性，特别是在使用高级超细粉末的情况下。在这项工作中，超细Si_3N_4粉末，通过高温等离子体氮化的硅，已被表征的XPS。氧、碳和少量钾被检测为表面杂质。Si 2p和Si（KLL）谱线可分解为Si3N4和SiO2相的两个组分。从角度分辨和Ar-离子深度剖面实验的层模型，由一个Si3N4核心覆盖的一个相对较厚的SiO2层和碳污染物覆盖层，可以阐明。
The mechanical properties of Si3N4 based ceramic bodies are largely controlled by the phases formed on the grain boundaries during sintering. For this reason determination of the state and the chemical composition of the surface of the starting Si3N4 powder is of prime theoretial and practical importance, especially in the cases when advanced ultrafine powders are used. In this work an ultrafine Si3N4 powder, obtained by high temperature plasma nitridation of silicon, has been characterized by XPS. Oxygen, carbon and also a small amount of potassium were detected as surface impurities. The Si 2p and Si (KLL) spectral lines could be decomposed into two components corresponding to silicon in Si3N4 and SiO2 phases. From angle-resolved and Ar-ion depth-profiling experiments a layer model, consisting of a Si3N4 core covered by a relatively thick SiO2 layer and a carbon contaminant overlayer, could be elucidated.