Rapid prototyping of patterned functional nanostructures
Rapid prototyping of patterned functional nanostructures
复制标题
DOI：
10.1038/35011026
复制
发表时间：
2000-05-04
期刊：
影响因子：
64.8
通讯作者：
Brinker, CJ
中科院分区：
文献类型：
--
作者：
Fan, HY;Lu, YF;Brinker, CJ
生命系统在多个长度尺度和多个位置展现形式和功能。为了模仿这种自然结构，有必要开发有效的策略来组装分层材料。传统的光刻技术虽然在微电子和微机电系统的制造中普遍存在，但对于定义低于 0.1 微米的特征尺寸是不切实际的，并且不太适合图案化学功能。最近，所谓的“软”光刻方法(1)已与表面活性剂(2,3)和颗粒(4)模板程序相结合，以创建具有多层次结构顺序的材料。但由此形成的材料主要限于没有特定功能的氧化物，并且相关的处理时间从几小时到几天不等。在这里，我们使用自组装“墨水”，将二氧化硅-表面活性剂自组装与三种快速印刷程序（笔式平版印刷、喷墨印刷和图案化自组装单层的浸涂）结合起来，在几秒钟内形成功能性的、分层组织的结构。我们描述的快速原型制作程序很简单，采用现成的设备，并提供计算机辅助设计和自组装纳米结构之间的联系。我们期望在任意表面上形成任意功能设计的能力对于直接写入传感器阵列和流体或光子系统具有实际重要性。
Living systems exhibit form and function on multiple length scales and at multiple locations. In order to mimic such natural structures, it is necessary to develop efficient strategies for assembling hierarchical materials. Conventional photolithography, although ubiquitous in the fabrication of microelectronics and microelectromechanical systems, is impractical for defining feature sizes below 0.1 micrometres and poorly suited to pattern chemical functionality. Recently, so-called 'soft' lithographic approaches(1) have been combined with surfactant(2,3) and particulate(4) templating procedures to create materials with multiple levels of structural order. But the materials thus formed have been limited primarily to oxides with no specific functionality, and the associated processing times have ranged from hours to days. Here, using a self-assembling 'ink', we combine silica-surfactant self-assembly with three rapid printing procedures-pen lithography, ink-jet printing, and dip-coating of patterned self-assembled monolayers-to form functional, hierarchically organized structures in seconds. The rapid-prototyping procedures we describe are simple, employ readily available equipment, and provide a link between computer-aided design and self-assembled nanostructures. We expect that the ability to form arbitrary functional designs on arbitrary surfaces will be of practical importance for directly writing sensor arrays and fluidic or photonic systems.