Surface smoothing effects with reactive cluster ion beams
Surface smoothing effects with reactive cluster ion beams
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反应性簇离子束的表面平滑效果
DOI：
10.1016/s0254-0584(98)00095-9
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发表时间：
1998
影响因子：
4.6
通讯作者：
I. Yamada
中科院分区：
文献类型：
--
作者：
N. Toyoda;Hiroaki Kitani;N. Hagiwara;J. Matsuo;I. Yamada
研究了反应团簇离子束的表面光顺效应，并与Ar团簇离子的光顺效果进行了比较。用SF6团簇离子束辐照了硅、碳化硅和钨。由于这些材料表现出反应溅射，溅射产额比只有物理溅射效应的Ar团簇离子高出一到两个数量级。在垂直入射条件下，SF6团簇离子使Au表面光滑，但对W表面粗糙度影响不大。反应溅射的表面光顺效果弱于物理溅射。用SF6团簇离子溅射的Au的角分布符合亚余弦规律，与用Ar团簇离子溅射的铜的角分布相似。这种溅射原子的亚余弦分布称为“横向溅射效应”。当W被SF6团簇离子照射时，像WFx这样的挥发性物质通过与F的化学反应而产生，它们被热蒸发。因此，角分布遵循余弦定律。因此，横向溅射效应是产生表面光顺效应的主要原因。
Surface smoothing effects of reactive cluster ion beams were studied and compared with those of Ar cluster ions. Si, SiC and W were irradiated with SF6cluster ion beams. As these materials show reactive sputtering, sputtering yields become one or two orders of magnitude higher than that of Ar cluster ions, which have only the physical sputtering effect. The Au surface was smoothed with SF6cluster ions at a normal incidence, however, the surface roughness of W was not improved with SF6cluster ions. The surface smoothing effect with reactive sputtering is weaker than that of physical sputtering. The angular distribution of Au sputtered with SF6cluster ion follows an under-cosine law, which is similar to that of Cu sputtered with Ar cluster ions. This under-cosine distribution of sputtered atoms is called the ‘lateral sputtering effect’. When W is irradiated with SF6cluster ions, volatile materials such as WFxare produced by a chemical reaction with F, and they are thermally evaporated. As a result, the angular distribution follows the cosine law. Therefore, the ‘lateral sputtering effect’ is responsible for the surface smoothing effect.
影响因子：
4.4
作者：
HAGENA, OF;OBERT, W
通讯作者：
OBERT, W