X-ray lithography for micro- and nano-fabrication at ELETTRA for interdisciplinary applications
X-ray lithography for micro- and nano-fabrication at ELETTRA for interdisciplinary applications
复制标题
DOI：
10.1088/0953-8984/16/33/013
复制
发表时间：
2004-08-25
影响因子：
2.7
通讯作者：
Candeloro, P
中科院分区：
文献类型：
--
作者：
Di Fabrizio, E;Fillipo, R;Candeloro, P
ELETTRA（http：//www.elettra.trieste.it/index.html）是在意大利的里雅斯特运行的第三代同步加速器辐射源设施，在几条不同的光束线上主持先进材料分析和加工、生物学和纳米科学方面的广泛研究活动。ELETTRA的能谱允许使用软X射线（1.5keV）和硬X射线（10keV）波长的X射线纳米光刻。跨学科光刻实验室（LIILIT）成立于1998年，是意大利国家倡议的一部分，对微型和纳米技术项目的INFM和资助和支持的意大利国家研究理事会（CNR），INFM和ELETTRA。LILIT为工程、科学和生物医学应用开发了两条专用的软X射线（1.5 keV）和硬X射线（10 keV）光刻光束线，用于微纳米制造活动。在本文中，我们提出了一个总结，我们的研究活动在微米和纳米制造涉及X射线纳米光刻LILIT的软，硬X射线束线。
ELETTRA (http://www.elettra.trieste.it/index.html) is a third generation synchrotron radiation source facility operating at Trieste, Italy, and hosts a wide range of research activities in advanced materials analysis and processing, biology and nano-science at several various beam lines. The energy spectrum of ELETTRA allows x-ray nano-lithography using soft (1.5 keV) and hard x-ray (10 keV) wavelengths. The Laboratory for Interdisciplinary Lithography (LIILIT) was established in 1998 as part of an Italian national initiative on micro- and nano-technology project of INFM and is funded and supported by the Italian National Research Council (CNR), INFM and ELETTRA. LILIT had developed two dedicated lithographic beam lines for soft (1.5 keV) and hard x-ray (10 keV) for micro- and nano-fabrication activities for their applications in engineering, science and bio-medical applications. In this paper, we present a summary of our research activities in micro- and nano-fabrication involving x-ray nanolithography at LILIT's soft and hard x-ray beam lines.