BRAGG GRATINGS FABRICATED IN MONOMODE PHOTOSENSITIVE OPTICAL FIBER BY UV EXPOSURE THROUGH A PHASE MASK
BRAGG GRATINGS FABRICATED IN MONOMODE PHOTOSENSITIVE OPTICAL FIBER BY UV EXPOSURE THROUGH A PHASE MASK
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DOI：
10.1063/1.108786
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发表时间：
1993-03-08
影响因子：
4
通讯作者：
ALBERT, J
中科院分区：
文献类型：
--
作者：
HILL, KO;MALO, B;ALBERT, J
介绍了一种利用石英玻璃制作的特殊位相掩模光栅在光敏光纤中制作折射率布拉格光栅的光刻方法。利用位相掩模光栅对垂直入射的KrF准分子激光光束(249 Nm)进行空间调制。衍射光形成周期的、高对比度的强度图案，其具有相位掩模光栅间距的一半，将折射率调制光压印到放置在掩模后面、接近并平行于掩模的光敏光纤的芯部；相位掩模光栅条纹垂直于光纤轴线取向。这种制作光纤内布拉格光栅的方法灵活、使用简单，降低了光栅写入装置的机械灵敏度，即使在空间和时间相干性较低的激光光源下也可以使用。
A photolithographic method is described for fabricating refractive index Bragg gratings in photosensitive optical fiber by using a special phase mask grating made of silica glass. A KrF excimer laser beam (249 nm) at normal incidence is modulated spatially by the phase mask grating. The diffracted light, which forms a periodic, high-contrast intensity pattern with half the phase mask grating pitch, photoimprints a refractive index modulation into the core of photosensitive fiber placed behind, in proximity, and parallel, to the mask; the phase mask grating striations are oriented normal to the fiber axis. This method of fabricating in-fiber Bragg gratings is flexible, simple to use, results in reduced mechanical sensitivity of the grating writing apparatus and is functional even with low spatial and temporal coherence laser sources.