Kinetics and mechanism of pyrolysis of some methylchlorosilanes
Kinetics and mechanism of pyrolysis of some methylchlorosilanes
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DOI：
10.1021/om00148a012
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发表时间：
1987-05
期刊：
影响因子：
2.8
通讯作者：
I. Davidson;C. E. Dean
中科院分区：
文献类型：
--
作者：
I. Davidson;C. E. Dean
本文用低压热解法研究了三甲基氯硅烷、二甲基氯硅烷和甲基二氯硅烷的热解动力学和产物。结果表明，这三种热解反应均以自由基链机理为主，硅烯或硅烯的参与很少。三甲基氯硅烷的热分解达到了非链条件，其硅-甲基键离解能为366.5±7 kJ mol ~（-1）。六氟化硫被发现是一个有用的陷阱的甲硅烷基自由基。
The kinetics and products of pyrolysis of trimethylchlorosilane, dimethylchlorosilane, and methyldi-chlorosilane have been studied by low-pressure pyrolysis. It was concluded that all three pyrolyses proceeded mainly by radical chain mechanisms, with little involvement of silylenes or silenes. Nonchain conditions were achieved for the pyrolysis of trimethylchlorosilane, leadingto a value of 366.5±7 kJ mol" 1 for the silicon-methyl bond dissociation energy in trimethylchlorosilane. Sulfur hexafluoride was found to be a useful trap for silyl radicals.