Proton Dynamics in Chemically Amplified Electron Beam Resists
Proton Dynamics in Chemically Amplified Electron Beam Resists
复制标题
化学放大电子束抗蚀剂中的质子动力学
DOI：
10.1143/jjap.43.l848
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发表时间：
2004
影响因子：
1.5
通讯作者：
S. Tagawa
中科院分区：
文献类型：
--
作者：
Hiroki Yamamoto;T. Kozawa;A. Nakano;K. Okamoto;Y. Yamamoto;T. Ando;Mitsuru Sato;H. Komano;S. Tagawa
用香豆素6(C6)研究了聚4-羟基苯乙烯(PHS)薄膜的质子动力学。在曝光剂量为10µC cm-2(75keV电子束)时，酸密度为0.022 nm-3。在一定的C6浓度下，C6质子加合物的吸收强度达到饱和，表明在该浓度下质子几乎完全加成。即使在室温下，质子也可以在C6分子附近的PHS膜中运动。用~(60)Coγ-射线估算了吸收剂量。酸产率可以用一个涉及碱聚合物电离的产酸模型很好地解释。
The proton dynamics of poly(4-hydroxystyrene) (PHS) films were investigated using Coumarin 6 (C6). The acid density was 0.022 nm-3 at the exposure dose of 10 µC cm-2 (75 keV electron beam). The absorption intensity of C6 proton adducts was saturated at a certain concentration of C6, indicating an almost complete addition of protons at this C6 concentration. Protons can move in PHS films near C6 molecules even at room temperature. Also, the absorbed dose was estimated using 60Co γ-rays. The acid yield can be well explained by an acid generation model involving the ionization of a base polymer.