Evaluation of a new high capacity, all‐tantalum molecular‐beam‐epitaxy arsenic cracker furnace
Evaluation of a new high capacity, all‐tantalum molecular‐beam‐epitaxy arsenic cracker furnace
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新型高容量全钽分子束外延砷裂解炉的评价
DOI：
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发表时间：
1990
期刊：
影响因子：
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通讯作者：
P. Colombo
中科院分区：
文献类型：
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作者：
R. Sacks;D. Eichler;R. Pastorello;P. Colombo
瓦里安第二代分子束外延 (MBE) 系统对一种新型喷射炉进行了评估，该炉通过热裂解和催化裂解相结合的方式将 As4 生产为 As2。该炉由两个温度区组成，配有一体式全钽组合坩埚、输送管和裂解区。 Ta挡板插入裂解区。 “热”升华区和“热”裂化区的热隔离是通过升华区的水或液氮冷却来实现的。裂解区温度为 1500°C，且 200 cc 容量升华器不通电时，升华区温度仅升至 75°C。 As4 的裂解在约 750°C 时开始，并在约 900°C 时饱和。 As 通量在约 1.25 小时内稳定。将裂解炉安装在以前用于旧砷喷射炉的位置会导致大量脱气，这是由于砷之前的冷凝以及旧炉口周围的低温罩上截留的杂质造成的。安装后不久，...
A novel effusion furnace for the production of As2 from As4 by combined thermal and catalytic cracking has been evaluated in a Varian GEN II molecular‐beam epitaxy (MBE) system. The furnace consists of two temperature zones with a one‐piece all‐tantalum combined crucible, delivery tube, and cracking zone. Ta baffles are inserted into the cracking zone. Thermal isolation of the ‘‘warm’’ sublimation zone and the ‘‘hot’’ cracking zone is achieved by water or liquid nitrogen cooling of the sublimation zone. With the cracking zone at 1500 °C and no power to the 200 cc capacity sublimator, the sublimation zone rises to only 75 °C. Cracking of As4 begins at about 750 °C and saturates at about 900 °C. The As flux stabilizes in about 1.25 h. Installation of the cracker furnace in a position previously used for the old As effusion furnace resulted in considerable outgassing due to the previous condensation of As and trapped impurities on the cryoshroud around the mouth of the old furnace. Soon after installation, g...