Quality assessment of antisticking layers for thermal nanoimprint
Quality assessment of antisticking layers for thermal nanoimprint
复制标题
热纳米压印防粘层的质量评估
DOI：
10.1116/1.3013342
复制
发表时间：
2008
影响因子：
1.4
通讯作者：
N. Bogdanski
中科院分区：
文献类型：
--
作者：
H. Scheer;W. Häfner;A. Fidler;S. Möllenbeck;N. Bogdanski
来自氟化三氯硅烷的层广泛用于防止纳米压印中的粘附。通常认为这些层是单层，结合到基底上，并且内部交联。作者研究了气相沉积过程中，这样的层的详细，不同的防粘剂的量和沉积时间在真空过程中。由层厚度确定层的质量，并测量接触角。根据一些最近的文献，声称从氟碳-三氯硅烷形成致密的交联单层是不可能的，结果表明沉积层不是单层。相反，作者认为它们是更薄的无序但交联的层。显然，防止粘附不需要单层形成。
Layers from fluorinated trichlorosilanes are in widespread use for the prevention of sticking in nanoimprint. It is generally assumed that these layers are monolayers, bonded to the substrate, and internally cross-linked. The authors have investigated a gas phase deposition process for such layers in detail, varying the amount of antisticking agent and the deposition time in a vacuum process. The quality of the layers was determined from the layer thickness and the contact angle was measured. In accordance with some recent literature, claiming that formation of dense cross-linked monolayers from fluorocarbon-trichlorosilanes is not possible, the results indicate that the deposited layers are not monolayers. Instead the authors suggest that they are even thinner disordered but cross-linked layers. Obviously monolayer formation is not required for sticking prevention.