G.Sadakuni,et al.: "Low Energy Bias Sputtcring of SiO_2 into Hihg Aspect Ratio Ternch Employing Axially Confined Hilicon Wave Plasma" Extended Abstr.of the 1994 Intern.Conf.on Sol.St.Devs.and Mats.643-645 (1994)
G.Sadakuni,et al.: "Low Energy Bias Sputtcring of SiO_2 into Hihg Aspect Ratio Ternch Employing Axially Confined Hilicon Wave Plasma" Extended Abstr.of the 1994 Intern.Conf.on Sol.St.Devs.and Mats.643-645 (1994)
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G.Sadakuni 等人：“Low Energy Bias Sputtcring of SiO_2 into Hihg Aspect Ratio Ternch Employing Axially Conconfed Hilicon Wave Plasma”Extend Abstr.of the 1994 Intern.Conf.on Sol.St.Devs.and Mats.643-645
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