Monolithic multiple colour emission from InGaN grown on patterned non-polar GaN.
Monolithic multiple colour emission from InGaN grown on patterned non-polar GaN.
复制标题
在图案化非极性 GaN 上生长的 InGaN 单片多色发射。
DOI:
10.1038/s41598-018-37575-7
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发表时间:
2019
影响因子:
4.6
通讯作者:
Gong Y
中科院分区:
文献类型:
--
作者:
Gong Y
A novel overgrowth approach has been developed in order to create a multiple-facet structure consisting ofonly non-polar and semi-polar GaN facets without involving any c-plane facets,allowing the major drawbacks of utilising c-plane GaN for the growth of III-nitride optoelectronics to be eliminated. Such a multiple-facet structure can be achieved by means of overgrowth on non-polar GaN micro-rod arrays onr-plane sapphire. InGaN multiple quantum wells (MQWs) are then grown on the multiple-facet templates. Due to the different efficiencies of indium incorporation on non-polar and semi-polar GaN facets, multiple-colour InGaN/GaN MQWs have been obtained. Photoluminescence (PL) measurements have demonstrated that the multiple-colour emissions with a tunable intensity ratio of different wavelength emissions can be achieved simply through controlling the overgrowth conditions. Detailed cathodoluminescence measurements and excitation-power dependent PL measurements have been performed, further validating the approach of employing the multiple facet templates for the growth of multiple colour InGaN/GaN MQWs. It is worth highlighting that the approach potentially paves the way for the growth of monolithic phosphor-free white emitters in the future.