Imprint Characteristics by Photo-Induced Solidification of Liquid Polymer
Imprint Characteristics by Photo-Induced Solidification of Liquid Polymer
复制标题
液态聚合物光致固化的压印特性
DOI：
10.1143/jjap.39.7075
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发表时间：
2000
影响因子：
1.5
通讯作者：
S. Matsui
中科院分区：
文献类型：
--
作者：
M. Komuro;J. Taniguchi;S. Inoue;Naoya Kimura;Yuji Tokano;H. Hiroshima;S. Matsui
从高产量和低成本设备的角度来看，纳米压印光刻是一种有吸引力的技术，用于40 nm临界尺寸以下的LSI时代。为了避免在传统的热压印工艺中由于热膨胀而导致的图案放置误差，我们尝试将模具图案复制到液体聚合物上，该液体聚合物在室温下使用紫外线（UV）光照射固化。这里使用的液体聚合物由TEIJIN SEIKI Co.，称为TSR-820。将其旋涂在载玻片上以产生约1.5 μ m厚的聚合物膜。在10 J/cm 2的剂量下观察到在UV曝光和在丙酮中冲洗后保留的厚度，并且随着曝光剂量的增加，其在约100 J/cm 2的UV曝光剂量下饱和。首先将由石英板制成的模具以约100 kg/cm 2压在聚合物膜上，然后使用为此工作开发的压印装置照射UV光。在从膜释放模具之后，在丙酮中冲洗基底以除去残留的液体聚合物。最终，100 nm的线和300 nm的空间图案的最小特征尺寸被成功地复制在聚合物中，具有良好的保真度。
Nanoimprint lithography is an attractive technology for LSIs era below 40-nm critical dimension from the viewpoints of high-throughput and low-cost equipment. In order to avoid a pattern placement error due to thermal expansion in the conventional thermal imprint process, we attempted to replicate the mold pattern onto a liquid polymer, which was solidified using ultra-violet (UV) light irradiation at room temperature. The liquid polymer used here was supplied by TEIJIN SEIKI Co., and termed TSR-820. It was spin coated on slide glass to produce approximately 1.5-µm-thick polymer film. The thickness remained after UV exposure and rinsing in acetone was observed at the dose of 10 J/cm2 and it saturated about a UV exposure dose of 100 J/cm2 with an increase in the exposure dose. The mold fabricated of quartz plate was first pressed onto the polymer film at about 100 kg/cm2 and then the UV light was irradiated using an imprint apparatus developed for this work. After releasing the mold from the film, the substrate was rinsed in acetone to remove the residual liquid polymer. Eventually the minimum feature size of 100-nm line and 300-nm space pattern was successfully replicated in the polymer with good fidelity.