Stabilizing Ni Catalysts by Molecular Layer Deposition for Harsh, Dry Reforming Conditions
Stabilizing Ni Catalysts by Molecular Layer Deposition for Harsh, Dry Reforming Conditions
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DOI：
10.1021/cs500809w
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发表时间：
2014-08-01
期刊：
影响因子：
12.9
通讯作者：
Medlin, J. Will
中科院分区：
文献类型：
--
作者：
Gould, Troy D.;Izar, Alan;Medlin, J. Will
为了抑制甲烷干重整（DRM）过程中类似于5 nm的负载型Ni颗粒的烧结，用ABC铝酮分子层沉积（MLD）生长的多孔氧化铝稳定催化剂。未涂覆的催化剂在DRM期间在973 K下连续失活。相反，MLD涂覆的催化剂的DRM速率在稳定化之前最初增加，这与暴露于高温的暴露镍表面积的增加一致。反应后颗粒较小的MLD涂覆的催化剂。仅具有5个MLD层的催化剂比未涂覆的催化剂具有更高的DRM速率，并且具有10个MLD层的样品保持稳定108 h。
To inhibit sintering of similar to 5 nm supported Ni particles during dry reforming of methane (DRM), catalysts were stabilized with porous alumina grown by ABC alucone molecular layer deposition (MLD). The uncoated catalyst continuously deactivated during DRM at 973 K In contrast, the DRM rates for the MLD-coated catalysts initially increased before stabilizing, consistent with an increase in the exposed nickel surface area with exposure to high temperatures. Post-reaction particles were smaller for the MLD-coated catalysts. Catalysts with only 5 MLD layers had higher DRM rates than the uncoated catalyst, and a sample with 10 MLD layers remained stable for 108 h.