Molten Salt Electrodeposition of Ni Aluminide Surface Layer and High Temperature Oxidation Resistance
Molten Salt Electrodeposition of Ni Aluminide Surface Layer and High Temperature Oxidation Resistance
复制标题
铝化镍表面层的熔盐电沉积及其高温抗氧化性能
DOI：
10.2320/jinstmet1952.66.7_684
复制
发表时间：
2002
影响因子：
--
通讯作者：
Toshiro Nagataki
中科院分区：
文献类型：
--
作者：
M. Fukumoto;M. Hara;Yoshiyuki Sato;Toru Kidachi;Toshiro Nagataki
通过电沉积Al并在熔盐中与Ni合金化，在Ni基体上形成Ni铝化物层。在含有1~5 molAlF3的等摩尔NaClKCl熔体中，在1023 K下，采用恒电位极化法对Al进行电解。电沉积材料的质量随着极化电位的增加而增加。在-1.2~-1.4 V（相对于Ag/Ag+(0.1)）下形成的沉积物形成了均匀的层。这些沉积物由镍铝化物组成，例如 Ni2Al3 和 NiAl。随着从表面到沉积物/基底界面的深度的增加，沉积层中的铝含量略有下降。电沉积层覆盖的镍比裸镍更耐高温氧化。
A Ni aluminide layer on Ni substrate was formed by electrodepositing Al and alloying it with Ni in molten salt. Electrolysis of Al was conducted using potentiostatic polarization method at constant potentials in an equimolar NaClKCl melt containing 1~5 molAlF3 at 1023 K. The mass of electrodeposited material increased with an increase in polarization potential. Deposits formed at -1.2~-1.4 V(vs. Ag/Ag+(0.1)) built up a homogeneous layer. These deposits consisted of Ni aluminide such as Ni2Al3 and NiAl. Al content in deposit layers slightly decreased with increasing depth from the surface to the deposit/substrate interface. Nickel covered by the electrodeposit layer was more resistant than bare nickel to high temperature oxidation.