Intensity Anomalies in Electron Diffraction Patterns of CuO
Intensity Anomalies in Electron Diffraction Patterns of CuO
复制标题
CuO 电子衍射图的强度异常
DOI：
10.1149/1.2781245
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发表时间：
1954
影响因子：
3.9
通讯作者：
J. M. Cowley
中科院分区：
文献类型：
--
作者：
J. M. Cowley
通过高分辨率电子衍射和电子显微镜检查了通过在空气中加热铜至 600°C 形成的氧化层，该氧化层具有所谓的 CuO~ 电子衍射图案。结果表明，将 CuO' 图案与正常 CuO 图案区分开来的强度异常并非如所暗示的那样是由于杂质造成的。氧化物以近似垂直于铜表面的长针状刺的形式生长，沿着每个刺的轴线具有一个或多个螺旋位错。 Eaeh 脊柱是 CuO 的单晶，直径约为 1000 A，沿（110）区轴伸长。 CuO' 图案的强度异常是由这种特殊的形态造成的。
The oxide layer, giving the so-called CuO~ electron diffraction pattern and formed by heating copper in air at 600~ has been examined by high-resolution electron diffraction~ nd electron microscopy. It is shown that the intensity anomalies which differentiate the CuO'pattern from the normal CuO pattern are not due to impurities as has been suggested. The oxide grows in the form of long needle-like spines approximately perpendicular to the copper surface, with one or more screw dislocations along the axis of each spine. Eaeh spine is a single crystal of CuO, about 1000 A in diameter, elongated along the (110) zone axis. Intensity anomalies of the CuO'pattern result from this particular morphology.