Confining Light to Deep Subwavelength Dimensions to Enable Optical Nanopatterning
Confining Light to Deep Subwavelength Dimensions to Enable Optical Nanopatterning
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DOI：
10.1126/science.1167704
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发表时间：
2009-05-15
期刊：
影响因子：
56.9
通讯作者：
Menon, Rajesh
中科院分区：
文献类型：
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作者：
Andrew, Trisha L.;Tsai, Hsin-Yu;Menon, Rajesh
在过去，在远场中通过光形成微尺度图案的分辨率被衍射限制为所使用的辐射波长的大约一半。在这里，我们展示了平均宽度为36纳米（nm）的线，约十分之一的照明波长λ（1）= 325 nm，通过在光致抗蚀剂上施加一层热稳定的光致变色分子。第二波长λ（2）= 633 nm的同时照射使得膜除了在节点位置处对写入光束不透明，节点位置允许入射λ（1）光的空间受限部分通过，从而允许亚衍射图案化。同样的实验还展示了周期线的图案，其宽度约为其周期的十分之一，这远远小于人们认为的光刻可能性。
In the past, the formation of microscale patterns in the far field by light has been diffractively limited in resolution to roughly half the wavelength of the radiation used. Here, we demonstrate lines with an average width of 36 nanometers (nm), about one-tenth the illuminating wavelength lambda(1) = 325 nm, made by applying a film of thermally stable photochromic molecules above the photoresist. Simultaneous irradiation of a second wavelength, lambda(2) = 633 nm, renders the film opaque to the writing beam except at nodal sites, which let through a spatially constrained segment of incident lambda(1) light, allowing subdiffractional patterning. The same experiment also demonstrates a patterning of periodic lines whose widths are about one-tenth their period, which is far smaller than what has been thought to be lithographically possible.