Focused ion-beam specimen preparation for atom probe field-ion microscopy characterization of multilayer film structures
Focused ion-beam specimen preparation for atom probe field-ion microscopy characterization of multilayer film structures
复制标题
用于多层膜结构原子探针场离子显微镜表征的聚焦离子束样品制备
DOI：
10.1088/0957-4484/10/1/010
复制
发表时间：
1999
期刊：
影响因子：
3.5
通讯作者：
G.D.W. Smith
中科院分区：
文献类型：
--
作者：
D. Larson;D. Foord;A. Petford;A. Cerezo;G.D.W. Smith
聚焦离子束铣削与直径小于10nm的镓离子束已被用于从多层膜纳米结构中制造场离子样品，该多层膜纳米结构包含直接沉积在平面衬底上的100个双层层。成功的场离子样品制备使得通过场离子成像和原子探针成分分析在原子尺度上观察这些层成为可能。
Focused ion-beam milling with a sub-10 nm diameter beam of gallium ions has been used to fabricate field-ion specimens from a multilayer film nanostructure containing 100 repetitions of a bilayer deposited directly onto a planar substrate. Successful field-ion specimen preparation has allowed the observation of these layers on the atomic scale by both field-ion imaging and atom probe compositional analysis.