A cationic surfactant assisted selective etching strategy to hollow mesoporous silica spheres
A cationic surfactant assisted selective etching strategy to hollow mesoporous silica spheres
复制标题
阳离子表面活性剂辅助空心介孔二氧化硅球的选择性蚀刻策略
DOI:
10.1039/c0nr00893a
复制
发表时间:
2011-01-01
期刊:
影响因子:
6.7
通讯作者:
Zheng, Nanfeng
中科院分区:
文献类型:
--
作者:
Fang, Xiaoliang;Chen, Cheng;Zheng, Nanfeng
Hollow mesoporous silica spheres have recently attracted increasing attention. However, effective synthesis of uniform hollow mesoporous spheres with controllable well-defined pore structures for fundamental research and practical applications has remained a significant challenge. In this work, a straightforward and effective "cationic surfactant assisted selective etching" synthetic strategy was developed for the preparation of high-quality hollow mesoporous silica spheres with either wormhole-like or oriented mesoporous shell. The as-prepared hollow mesoporous silica spheres have large surface area, high pore volume, and controllable structure parameters. Our experiments demonstrated that cationic surfactant plays critical roles in forming the hollow mesoporous structure. A formation mechanism involving the etching of solid SiO2 accelerated by cationic surfactant followed by the redeposition of dissolved silica species directed by cationic surfactant is proposed. Furthermore, the strategy can be extended as a general strategy to transform silica-coated composite materials into yolk-shell structures with either wormhole-like or oriented mesoporous shell.