Deposition and properties of a-C:H films on polymethyl methacrylate by electron cyclotron resonance microwave plasma chemical vapor deposition method
Deposition and properties of a-C:H films on polymethyl methacrylate by electron cyclotron resonance microwave plasma chemical vapor deposition method
复制标题
DOI：
10.1016/s0257-8972(99)00479-x
复制
发表时间：
2000-01
影响因子：
5.4
通讯作者：
X. Zhou;S. Lee;I. Bello;A. Cheung;D. Chiu;Y. Lam;Chun‐Sing Lee;K. Leung;X. M. He
中科院分区：
文献类型：
--
作者：
X. Zhou;S. Lee;I. Bello;A. Cheung;D. Chiu;Y. Lam;Chun‐Sing Lee;K. Leung;X. M. He
使用电子回旋共振 (ECR) 微波等离子体 (MP) 分解在 Ar 气体中稀释的 CH4，将 a-C:H 薄膜沉积在聚甲基丙烯酸甲酯 (PMMA) 上。研究了基底对a-C:H薄膜沉积过程、光学性能和结构的影响。在相同的生长条件下，在 PMMA 上形成透明的类聚合物碳膜，而在硅上形成半透明的类金刚石碳 (DLC)。研究发现，在一定条件下生长的 a-C:H 薄膜可以显着提高 PMMA 基材的耐磨性。
a-C:H films were deposited on polymethyl methacrylate (PMMA) using electron cyclotron resonance (ECR) microwave plasma (MP) decomposition of CH4diluted in Ar gas. The effect of substrate on the deposition process, optical properties and structure of the a-C:H films was studied. A transparent polymer-like carbon film formed on PMMA, while a semi-transparent diamond-like carbon (DLC) formed on silicon under the same growth conditions. The a-C:H films grown under certain conditions were found to substantially improve the wear resistance of PMMA substrates.