A new measurement and treatment for kinetics of isothermal oxidation of Si3N4
A new measurement and treatment for kinetics of isothermal oxidation of Si3N4
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DOI:
10.1016/j.jallcom.2007.04.255
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发表时间:
2008-07
影响因子:
6.2
通讯作者:
X. Hou;K. Chou;Xiaojun Hu;Hailei Zhao
中科院分区:
文献类型:
--
作者:
X. Hou;K. Chou;Xiaojun Hu;Hailei Zhao
The kinetics of the oxidation of α-Si3N4powder has been investigated in the temperature range from 1373 to 1573K experimentally in the air by using thermogravimetry. The results show that the major oxidation product was crystalline SiO2and the oxidation reaction was mainly diffusion-controlled. Based on the experiment data, the new model for predicting the isothermal oxidation process of α-Si3N4powder has been used, which offers an analytic form expressing the oxidation weight gain as a function of time and temperature explicitly. The comparison between experimental data and theoretical calculation shows that this new model works very well. Based on our model the activation energy for the oxidation of α-Si3N4has been calculated to be 325.6kJ/mol.