Vacuum ultraviolet emission and H- production in a low pressure hydrogen plasma
Vacuum ultraviolet emission and H- production in a low pressure hydrogen plasma
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低压氢等离子体中的真空紫外发射和 H- 生产
DOI：
10.1088/0022-3727/17/11/009
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发表时间：
1984
期刊：
影响因子：
--
通讯作者：
W. Graham
中科院分区：
文献类型：
--
作者：
W. Graham
利用低压氢等离子体的真空紫外光发射研究了振动激发基态分子的产生机制，认为基态分子在负氢离子产生中起重要作用。本文的结果与Hiskes(1980)的理论计算相一致。V>；或=5的分子的产生速度已被估计，并且足以使这种等离子体中的氢产生通过这些分子。
The vacuum ultraviolet emission from a low pressure hydrogen plasma has been used to study the production mechanism for vibrationally excited ground state molecules thought to be important in negative hydrogen ion production. The present results are in agreement with theoretical calculations by Hiskes (1980). The rate of production of molecules with v>or=5 has been estimated and is sufficient to allow H- production in such plasmas to be via these molecules.