ELID grinding and tribological characteristics of TiAlN film
ELID grinding and tribological characteristics of TiAlN film
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TiAlN薄膜的ELID磨削及摩擦学特性
DOI：
10.1016/s0890-6955(02)00076-7
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发表时间：
2002
影响因子：
14
通讯作者：
T. Kato
中科院分区：
文献类型：
--
作者：
K. Katahira;Y. Watanabe;H. Ohmori;T. Kato
本文介绍了在 TiAlN 薄膜上进行电解在线修整 (ELID) 磨削实验的结果以及所生产薄膜的摩擦学特性的表征。在通过物理气相沉积涂覆的先进薄膜（例如 CrN 和 TiAlN）中，仅使用涂覆工艺很难获得获得优异摩擦学特性所需的低表面粗糙度。砂轮的 ELID 提高了砂轮性能，能够在脆性材料上实现镜面光洁度，表面粗糙度达到纳米级（4 至 6 nm）。在本研究中，通过 ELID 技术制造了高质量的 TiAlN 薄膜表面，通常通过使用 SD#30,000 砂轮实现 Ra 0.0024 μm 左右的表面粗糙度。扫描电子显微镜显示，ELID 改善了光洁度，如磨痕形状所示。能量色散X射线衍射系统的化学元素分析表明，ELID研磨在TiAlN薄膜的加工表面形成了氧化层。因此，除了高度光滑的表面之外，ELID研磨形成的氧化层还赋予ELID研磨的TiAlN薄膜优异的摩擦学性能。
This paper presents the results of electrolytic in-process dressing (ELID) grinding experiments performed on TiAlN film and characterization of the tribological characteristics of the produced films. In advanced films coated by physical vapor deposition, such as CrN and TiAlN, the low surface roughness required for attaining superior tribological characteristics is difficult to attain by use of only a coating process. ELID of grinding wheels improves wheel performance, enabling the attainment of specular finishes on brittle materials, with surface roughness on the nanometer scale (4 to 6 nm). In the present study, high-quality TiAlN film surfaces were fabricated by the ELID technique, typically achieving a surface roughness of around Ra 0.0024 μm by employment of a SD#30,000 wheel. Scanning electron microscopy reveals that ELID improved the finish, as indicated by the shape of grinding marks. Chemical element analysis by an energy-dispersed x-ray diffraction system suggests that ELID grinding formed an oxide layer in the machined surface of TiAlN film. Therefore, in addition to the highly smooth surface, an oxide layer formed by ELID grinding imparts superior tribological properties to ELID-ground TiAlN film.