Time-domain study of proximity-effect induced transition shifts

Time-domain study of proximity-effect induced transition shifts
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邻近效应引起的转变位移的时域研究

DOI:
10.1109/20.133294
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发表时间:
1991
期刊:
影响因子:
--
通讯作者:
Yaw
Yaw
中科院分区:
--
文献类型:
--
作者:
C. Tsang;Yaw

文献摘要

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本文发展了一种精确测量邻近效应引起的非线性跃迁位移的时域技术,并将这种技术应用于薄膜感应磁头在高矫顽力和高矫顽矩形比的金属薄膜磁盘上的写入情况。在高密度显着的接近移位,即使当可写性可以被认为是良好的重写和硬过渡移位标准。此外,邻近位移的许多基本性质已被实验清楚地解决,包括邻近位移的吸引力和长程性质,低密度下涟漪结构的存在,以及邻近位移和硬跃迁效应之间的非线性相互作用。建模研究也被用来获得一个很好的理解这些属性,和理论结果显示出良好的定性协议与实验的邻近位移行为。
An accurate time-domain technique for measuring the proximity-effect-induced nonlinear transition shift has been developed, and this technique is applied to the case of a thin-film inductive head writing on a metal-film disk of high coercivity and high coercive squareness. Significant proximity shift at high densities is shown, even when the writeability may be considered good by overwrite and hard transition shift criteria. Furthermore, many basic properties of the proximity shift have been clearly resolved by the experiments, including the attractive and long-range nature of the proximity shift, the presence of ripple structures at low densities, and the nonlinear interactions between the proximity shift and the hard transition effect. Modeling studies have also been used to obtain a good understanding of these properties, and the theoretical results show good qualitative agreement with the experimental proximity-shift behavior.