Mutual modulation of F-distribution and N-configuration in F and N dual-functionalized graphene
Mutual modulation of F-distribution and N-configuration in F and N dual-functionalized graphene
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F、N双功能化石墨烯中F分布和N构型的相互调节
DOI：
10.1016/j.apsusc.2018.09.245
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发表时间：
--
影响因子：
6.7
通讯作者：
Cao Dawei
中科院分区：
文献类型：
--
作者：
Liu Yuan;Shen Peng;Feng Lai-he;Wu Yan;Chen Ming-ming;Sun Yuan-yuan;Feng Qian;Cao Dawei
氟化和氮掺杂是石墨烯改性的两种可行途径。然而，很难调节F分布和N构型。在这里，我们发现，通过F和N原子之间的相互影响，F-分布和N-配置可以很容易地调制。简而言之，通过退火F和N双官能化石墨烯，（i）F-分布倾向于离散，以及（ii）石墨N-构型逐渐转化为吡啶，以及吡啶到吡咯N-构型。理论计算表明，F分布的调制是由于N原子的吸附能力，而N构型的调制是由于F降低了N构型的稳定性。此外，我们还发现F分布和N构型的相互调制可以增强电子空穴对的辐射复合，使光致发光强度提高到320.69%。该工作为调控杂原子的分布和构型提供了一种简便的策略，拓宽了双功能化石墨烯的潜在应用。
Fluorination and N-doping are two feasible routes to modify the properties of graphene. However, it’s difficult to modulate the F-distribution and N-configuration. Here, we found that by the mutual influence between F and N atoms, F-distribution and N-configuration can be facilely modulated. In brief, by annealing F and N dual-functionalized graphene, (i) F-distribution tended to be discrete, and (ii) graphitic N-configuration was progressively converted to pyridinic, and pyridinic to pyrrolic N-configuration. Theoretical calculations indicated that the modulation of F-distribution was due to the adsorptive ability of N atoms, and N-configuration was modulated because F decreased the stability of N-configuration. Furthermore, we found that the mutual modulation of F-distribution and N-configuration could reinforce the radiative recombination of electron-hole pairs, which increased the photoluminescence intensity to 320.69%. This work provides a facile strategy to modulate the distribution and configuration of heteroatoms, broadening the potential applications of dual-functionalized graphene.