Multiple patterning with process optimization method for maskless DMD-based grayscale lithography
Multiple patterning with process optimization method for maskless DMD-based grayscale lithography
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DOI：
10.1016/j.proeng.2015.08.778
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发表时间：
2015
期刊：
影响因子：
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通讯作者：
Xiaoxu Ma;Y. Kato;F. V. Kempen;Y. Hirai;T. Tsuchiya;F. Keulen;O. Tabata
中科院分区：
文献类型：
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作者：
Xiaoxu Ma;Y. Kato;F. V. Kempen;Y. Hirai;T. Tsuchiya;F. Keulen;O. Tabata
我们报告了一种利用基于数字微镜器件（DMD）的灰度光刻的多重图案化方法，提供了一种解决方案，以提高整个目标三维结构的制造精度。基于DMD的光刻系统由投影透镜系统组成，与焦深的外部区域相比，焦深周围可以获得更好的分辨率。因此，对于厚膜抗蚀剂微结构化，用单独的灰度掩模在多个焦点位置曝光导致制造精度的提高。为了找到多个焦点位置及其灰度掩模的最佳组合，将计算优化与多重图案化方法相结合。通过实验验证了该方法的有效性。
We report a multiple patterning approach utilizing digital-micromirror-device (DMD)-based grayscale lithography, providing a solution to improve fabrication accuracy for entire target three-dimensional structure. Because DMD-based lithography system consists a projection lens system, better resolution can be obtained around focal position comparing to the outer region of depth of focus. Thus, for thick-film resist micro structuring, exposing with multiple focal positions with separate grayscale masks leads to improvement of fabrication accuracy. In order to find the best combination of the multiple focal positions and their grayscale masks, the computational optimization is combined to the multiple patterning approach. Through a several experiments, effectiveness of the proposed approach was successfully demonstrated.