Plasma generation and plasma sources
Plasma generation and plasma sources
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DOI：
10.1088/0963-0252/9/4/301
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发表时间：
2000-11-01
影响因子：
3.8
通讯作者：
Schmidt, M
中科院分区：
文献类型：
--
作者：
Conrads, H;Schmidt, M
本文回顾了最常用的等离子体生成方法，特别强调了非热、低温等离子体的技术应用。我们还讨论了针对选定应用的等离子体源的各种技术实现。本文进一步仅限于讨论利用电场的等离子体生成方法。所描述的各种等离子体包括去辉光放电，连续操作(CW)或脉冲操作、电容性和电感性耦合射频放电、螺旋放电和微波放电。详细讨论了封闭结构（腔）、开放结构（表面加速器、平面等离子体源）和磁场（电子回旋共振源）中等离子体技术实现的各种示例。最后，我们提到电介质阻挡放电是高压（高达大气压）下非热等离子体和束产生等离子体的便捷来源。本文的主要目的是概述各种不同的等离子体生成方法和等离子体源，并强调等离子体的广泛特性，这些特性反过来又导致了各种不同的技术和技术应用。
This paper reviews the most commonly used methods for the generation of plasmas with special emphasis on non-thermal, low-temperature plasmas for technological applications. We also discuss various technical realizations of plasma sources for selected applications. This paper is further limited to the discussion of plasma generation methods that employ electric fields. The various plasmas described include de glow discharges, either operated continuously (CW) or pulsed, capacitively and inductively coupled rf discharges, helicon discharges, and microwave discharges. Various examples of technical realizations of plasmas in closed structures (cavities), in open structures (surfatron, planar plasma source), and in magnetic fields (electron cyclotron resonance sources) are discussed in detail. Finally, we mention dielectric barrier discharges as convenient sources of non-thermal plasmas at high pressures (up to atmospheric pressure) and beam-produced plasmas. It is the main objective of this paper to give an overview of the wide range of diverse plasma generation methods and plasma sources and highlight the broad spectrum of plasma properties which, in turn, lead to a wide range of diverse technological and technical applications.