Rapid deposition of (K,Na)NbO3 thick films using microwave-assisted hydrothermal technique
Rapid deposition of (K,Na)NbO3 thick films using microwave-assisted hydrothermal technique
复制标题
利用微波辅助水热技术快速沉积 (K,Na)NbO3 厚膜
DOI：
10.35848/1347-4065/aba50e
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发表时间：
2020
影响因子：
1.5
通讯作者：
H. Funakubo
中科院分区：
文献类型：
--
作者：
H. Uchida;Masaki Okura;Yoshiharu Ito;T. Shiraishi;T. Kiguchi;T. Konno;H. Funakubo
提出了利用微波（MW）加热快速水热沉积（K,Na）NbO3 （KNN）厚膜的方法，可在1 h内短时间制备出厚度为几微米的铁电/压电薄膜。在180℃~ 240℃的反应温度下，在1 h内成功地在（100）SrTiO3:Nb和（100）SrRuO3//(100)SrTiO3单晶衬底上沉积了外延KNN薄膜；在220℃下加热40 min，可获得厚度大于10 μm的薄膜。所得到的薄膜具有与传统热液沉积的KNN薄膜相当的畴结构和介电/铁电性能。
Rapid processing for hydrothermal deposition of (K,Na)NbO3 (KNN) thick films was proposed with the assistance of microwave (MW) heating, for short-time fabrication of ferroelectric/piezoelectric films with thicknesses of several micrometers within 1 h. MW irradiation raised the temperature of water medium up to 240 °C within 10 min, whereas conventional heating using hot-air convection required more than 2 h. Epitaxial KNN films were successfully deposited on single-crystal substrates of (100)SrTiO3:Nb and (100)SrRuO3//(100)SrTiO3 at reaction temperature of 180 °C–240 °C within 1 h; especially, the films with thicknesses over 10 μm could be obtained on at 220 °C for 40 min. The resulting film exhibited domain structure and dielectric/ferroelectric properties comparable with the KNN films derived from conventional hydrothermal deposition.
影响因子：
4.5
作者：
T. Shiraishi;Yuta Muto;Yoshiharu Ito;T. Kiguchi;Kazuhisa Sato;M. Nishijima;H. Yasuda;H. Funakubo-H.-Funaku
通讯作者：
T. Shiraishi;Yuta Muto;Yoshiharu Ito;T. Kiguchi;Kazuhisa Sato;M. Nishijima;H. Yasuda;H. Funakubo-H.-Funaku
DOI：
10.1143/jjap.46.7039
发表时间：
2007-10-01
期刊：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS
影响因子：
--
作者：
Wada, Satoshi;Takeda, Kotaro;Kimura, Toshio
通讯作者：
Kimura, Toshio