From meandering to faceting, is step flow growth ever stable?
From meandering to faceting, is step flow growth ever stable?
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DOI：
10.1103/physrevlett.91.226103
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发表时间：
2003-11
影响因子：
8.6
通讯作者：
N. Néel;T. Maroutian;L. Douillard;H.‐J. Ernst
中科院分区：
文献类型：
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作者：
N. Néel;T. Maroutian;L. Douillard;H.‐J. Ernst
基于氦原子束衍射和扫描隧道显微镜的数据，在一类非重构金属邻面Cu（1，1，n），n= 5，9，17中，建立了在同质外延台阶流动生长过程中弯曲和聚束不稳定性的共存.具体而言，蜿蜒的不稳定性被示出作为聚束不稳定性的前兆，表明聚束的一维处理步骤流增长是不够的。我们的发现可能对于动力学限制系统中的步进流量增长具有通用性。
Based on helium atom beam diffraction and scanning tunneling microscopy data, the coexistence of a meandering and a bunching instability during homoepitaxial step flow growth is established in a class of nonreconstructed, metallic vicinal surfaces, Cu (1,1,n), n=5,9,17. Specifically, the meandering instability is shown to act as a precursor to the bunching instability, indicating that a one-dimensional treatment of bunching in step flow growth is not sufficient. Our findings might be generic to step flow growth in kinetically restricted systems.