Dependence of Si faceted dendrite growth velocity on undercooling
Dependence of Si faceted dendrite growth velocity on undercooling
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DOI：
10.1063/1.3543623
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发表时间：
2011-01
影响因子：
4
通讯作者：
Xinbo Yang;K. Fujiwara;K. Maeda;J. Nozawa;H. Koizumi;S. Uda
中科院分区：
文献类型：
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作者：
Xinbo Yang;K. Fujiwara;K. Maeda;J. Nozawa;H. Koizumi;S. Uda
采用原位观察的方法，观察了不同过冷度（ΔT）下由相同平行孪晶生长的Si小面枝晶，并研究了小面枝晶生长速度（Vd）与过冷度的关系。Vd随ΔT的增加而线性增加。采用基于理论枝晶生长速度的模型分析了小面枝晶生长速度与过冷度的关系。利用该模型得到的结果与实验结果吻合较好，并表明孪晶间距对枝晶生长速度-过冷度关系有显著影响。
Si faceted dendrites grown from the same parallel twins under different undercooling (ΔT) were observed by in situ observation, and the dependence of faceted dendrite growth velocity (Vd) on undercooling was investigated. Vd increase linearly as the increasing ΔT. The faceted dendrite growth velocity-undercooling relationship was analyzed using a model developed on the basis of theoretical dendrite growth velocity. The results obtained using the proposed model fit the experimental results well and indicate that the twin spacing markedly affects the dendrite growth velocity-undercooling relationship.