Effective solvothermal deoxidization of graphene oxide using solid sulphur as a reducing agent

Effective solvothermal deoxidization of graphene oxide using solid sulphur as a reducing agent
复制标题

DOI:
10.1039/c2jm31940c
复制
发表时间:
2012-01-01
影响因子:
--
通讯作者:
Zhang, Shaowei
Zhang, Shaowei
中科院分区:
其他
文献类型:
--
作者:
Lin, Liangxu;Zhang, Shaowei

文献摘要

被引文献

相似文献

以固体硫(S)和氧化石墨烯(GO)为原料,在H2O-NMP或H2O-DMF(体积比为1:1)溶剂中,在110℃下反应10h,制备了高电导的无官能团石墨烯材料,紫外-可见光谱(UV/Vis)分析表明,S在沸腾的GO水溶液中表现出较强的还原能力。用NMP或DMF作为表面活性剂,使溶剂的表面张力接近石墨烯的表面能,可进一步提高其还原效果。UV/Vis和X-射线光电子能谱(XPS)结果表明,石墨烯的电子结构完全恢复,氧含量显著降低。未发现还原GO(RGO)之间的石墨堆积现象。所制备的RGO产品在各种溶剂中也表现出良好的分散性。此外,它可以在不同形式之间相互转换:凝聚体、简单的风干散装固体和薄膜以及分散良好的悬浮液。
Functional group free graphene materials with high electronic conductivities were prepared via solvothermal reaction of solid sulphur (S) and graphene oxide (GO) in a H2O-NMP or H2O-DMF (1 : 1 in volume ratio) solvent at 110 degrees C for 10 h. Ultraviolet-visible (UV/Vis) analysis revealed that S exhibited strong reductive ability in a boiling GO aqueous solution. Its reducing effect could be further enhanced by using NMP or DMF as a surfactant to adjust the solvent surface tension close to the surface energy of graphene. UV/Vis and X-ray photoelectron spectroscopy (XPS) results confirmed that the electronic structure of graphene had been completely restored and the oxygen contents reduced remarkably. No graphitic stacking between the reduced GO (RGO) was found. As-prepared RGO products also exhibited good dispersivities in various solvents. Moreover, it was inter-convertible between their different forms: agglomerates, simply air dried bulk solids and films and well-dispersed suspensions.