Slotted Waveguide Field Applicator for the Generation of Long Uniform Plasmas
Slotted Waveguide Field Applicator for the Generation of Long Uniform Plasmas
复制标题
用于产生长均匀等离子体的开槽波导场施加器
DOI：
10.1080/08327823.1993.11688214
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发表时间：
1993
影响因子：
1.5
通讯作者：
Z. Zakrzewski
中科院分区：
文献类型：
--
作者：
G. Sauve;M. Moisan;Z. Zakrzewski
本文报道了一种用于维持各种应用所需的长轴向均匀气体放电的小宽度、长微波场加速器的实验研究。基于WR-430波导宽壁上的缝隙阵列，Ji和Gerling[1988]在自由空间条件下进行了低功率模拟测试，描述了这种施加器。本研究包括低功率测量以及在实际放电装置中的实验。结果表明，即使是没有可调元件的简单结构，也能保证有效地向等离子体传递能量和良好的轴向均匀性。还给出了涂抹器的设计和有效使用的指示。
This paper reports the experimental study of a small width, long microwave field applicator used to sustain long, axially uniform gaseous discharges as required in various applications. Based on an array of slots in the wide wall of a WR-430 waveguide, this applicator was described earlier by Ji and Gerling [1988] who performed low-power simulating tests under free-space conditions. The present investigation includes low-power measurements as well as experiments in an actual discharge setup. It is shown that even a simple structure with no adjustable elements can assure an efficient power transfer to plasma and good axial uniformity. Indications for the design and efficient use of the applicator are also given.