High-resolution spectrum of xenon ions at 13.4 nm.
High-resolution spectrum of xenon ions at 13.4 nm.
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DOI：
10.1364/ol.28.001478
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发表时间：
2003-08
期刊：
影响因子：
3.6
通讯作者：
S. Churilov;Y. N. Joshi;J. Reader
中科院分区：
文献类型：
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作者：
S. Churilov;Y. N. Joshi;J. Reader
在9.5- 15.5nm范围内拍摄了氙在低电感真空火花中激发的高分辨光谱。所观察到的转换被确定为属于从Xe 8+到Xe 13+的离子。在13.4 nm附近的极紫外光刻的重要区域，最强的线被确定为4d 8 - 4d 7的5 p跃迁的Xe 10+。利用沿着等电子序列外推的能量参数进行了鉴定。
The spectrum of xenon excited in a low-inductance vacuum spark was photographed at high resolution in the region of 9.5-15.5 nm. The observed transitions were identified as belonging to ions from Xe8+ to Xe13+. In the region of importance for extreme-ultraviolet lithography around 13.4 nm, the strongest lines were identified as 4d8-4d7 5p transitions in Xe10+. The identifications were made by use of energy parameters extrapolated along the isoelectronic sequence.