Nanoimprint Fabrication and Thermal Behavior of Atomically Ultrasmooth Glass Substrates with 0.2-nm-Height Steps
Nanoimprint Fabrication and Thermal Behavior of Atomically Ultrasmooth Glass Substrates with 0.2-nm-Height Steps
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0.2 纳米高度台阶的原子级超光滑玻璃基板的纳米压印制造和热行为
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发表时间：
2011
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通讯作者：
M. Yoshimoto
中科院分区：
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作者：
Y. Miyake;Y. Akita;H. Oi;M. Mita;S. Kaneko;K. Koyama;K. Sunagawa;K. Tada;Y. Hirai;M. Yoshimoto
我们研究了通过热纳米压印技术使用具有0.2 nm高度原子台阶的蓝宝石（α-Al 2 O3单晶）模具在商业硅酸盐玻璃衬底上开发原子台阶超光滑表面的条件。在3 MPa、300 s和610 °C的压印压制条件下，可以在玻璃化转变温度为521 °C的钠钙硅酸盐玻璃基板上形成0.2 nm高的阶梯状原子级超光滑台阶表面。我们发现，在490 °C退火后，压印玻璃表面的0.2 nm高的台阶结构消失，并且平台的光滑度增加。
We examined the conditions for the development of atomically stepped ultrasmooth surfaces on commercial silicate glass substrates by the thermal nanoimprint technique using sapphire (α-Al2O3 single crystal) molds with 0.2-nm-height atomic steps. Under the pressing conditions of 3 MPa, 300 s, and 610 °C for imprinting, a 0.2-nm-high stepped and atomically ultrasmooth terraced surface could be formed on soda-lime silicate glass substrates having the glass transition temperature of 521 °C. We found that the 0.2-nm-height step structure of the imprinted glass surface disappeared after annealing at 490 °C, and the smoothness of the terrace increased.