Silicon nitride ceramics consolidated by oscillatory pressure sintering
Silicon nitride ceramics consolidated by oscillatory pressure sintering
复制标题
振荡压力烧结固结氮化硅陶瓷
DOI：
10.1016/j.ceramint.2020.02.021
复制
发表时间：
2020
影响因子：
5.2
通讯作者：
Xie Zhipeng
中科院分区：
文献类型：
--
作者：
Qin Xiaowei;Li Shuang;Zhao Lin;Sheng Liwen;Xie Zhipeng
本文报道了用振荡压力烧结法（OPS）制备高抗弯强度氮化硅（Si_3N_4）陶瓷。研究了烧结工艺对Si 3 N4陶瓷晶粒长大、显微组织演变和力学性能的影响。结果表明，与传统的气压烧结工艺相比，OPS工艺可以在较短的烧结时间和较低的烧结温度下制备出致密度较高的Si 3 N4陶瓷，从而获得较高的抗弯强度和维氏硬度。OPS促进了Si 3 N4的α-β相转变，有利于液相中离子的扩散，提高了β-Si 3 N4晶粒的长径比。在1720 °C烧结的Si 3 N4陶瓷具有较高的抗弯强度和维氏硬度，分别为1432 ± 51 MPa和16.14 ± 0.38 GPa，显示了其在高性能陶瓷开发方面的潜力。
We report the fabrication of silicon nitride (Si3N4) ceramics with high flexural strength by oscillatory pressure sintering (OPS). The effects of the sintering procedure on the grain growth, microstructure evolution, and mechanical properties of Si3N4were investigated. It was found that, in comparison to the traditional gas pressure sintering technique, the OPS process produced Si3N4ceramics with higher density with a shorter sintering time and lower sintering temperature, leading to products with higher bending strength and Vickers hardness. Furthermore, the OPS promoted the α-β phase transformation of Si3N4, which facilitated the ion diffusion rate in the liquid phase and increased the aspect ratio of the formed β-Si3N4grains. The Si3N4ceramics sintered at 1720 °C by OPS exhibited high bending strength and Vickers hardness of 1432 ± 51 MPa and 16.14 ± 0.38 GPa, respectively, representing their potential for exploring ceramics with high performances.