High-power KrF excimer laser with a solid state switch for microlithography
High-power KrF excimer laser with a solid state switch for microlithography
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用于微光刻的具有固态开关的高功率 KrF 准分子激光器
DOI：
10.1117/12.240945
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发表时间：
1996
期刊：
影响因子：
--
通讯作者：
T. Koganezawa
中科院分区：
文献类型：
--
作者：
H. Mizoguchi;N. Ito;H. Nakarai;Yukio Kobayashi;Y. Itakura;H. Komori;O. Wakabayashi;Taketo Aruga;T. Sakugawa;T. Koganezawa
研制了一种新型KrF准分子激光器KLES-G7，它采用了一种简单的固态脉冲功率电路。该SPC具有维护成本低、可靠性高等优点。该激光器的输出功率为7.5W，带宽为0.8，频率为600 Hz，能量为10 mJ。激光器的性能和稳定性进行了论证。SPC的维护间隔大于10 × 109脉冲。与旧型号相比，KLES-G7减少了20%的光子成本。它将加速64 Mbit DRAM之后的量产。
New KrF excimer laser for microlithography KLES-G7 with a new simple solid state pulsed power circuit (SPC) is developed. This SPC has several advantages such as less maintenance cost and the higher reliability. The laser realizes 7.5W with 0.8 bandwidth, 600 Hz, 10mJ. The performance and the stability of the laser is demonstrated. The maintenance interval of the SPC is more than 10 X 109 pulse. The KLES-G7 reduces 20 percent of the photon cost compared with the old model. It will accelerate the mass production of after 64Mbit DRAM.